No more oxidised wafers

Oxygen-free production with the N2 purge system.

When wafers need to be transported and stored in the semiconductor industry, the N2 purge system from Festo prevents oxygen from oxidising the wafers. The cost-efficient, pre-assembled flow controller continuously supplies the wafer reservoir (FOUP) with inert nitrogen for this.

The Festo N2 purge system is tailored to the requirements of modern semiconductor production. Both the generally restricted space in the production area as well as the strict quality demands for the operating equipment have been taken into consideration in this highly integrated system solution. What’s more, the solution from Festo also offers decisive benefits, such as affordable procurement and operation, that meet the cost awareness associated with the short innovation cycles in the electronics industry.

Costs for assembly and tubing as well as test times are reduced, since the user receives a pre-assembled functional unit instead of several individual components. Expenses for an extra stainless-steel tube with fittings are eliminated. The flow controller can also be integrated into an overhead transport system to transport wafers safely.

Long service life, no wear

The design of the piezo valve reduces the risk of contamination in the gas flow caused by particle abrasion over the entire service life. The peak value is approximately for a particle of size 0.1 micrometres per switching cycle. Conventional solutions generate five times the particle content. The piezo technology used prevents wear due to friction, thus considerably lengthening the service life of the valve. In comparison to conventional solutions, this results in significant savings in operation and maintenance.

Leak-proof and economical

The compact flow controller has just two pneumatic connections, reducing the risk of leakages. The energy consumption is less than a watt. In both cases that is 80% less than with conventional solutions such as proportional regulators. The closed control loop ensures an accurate, stable and linear behaviour of the flow rate – without hysteresis. The repetition accuracy is +/-0.25% of the setpoint value.

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